Recent progress in performance enhancement methods for capacitive silicon resonator will be outlined in this work. Several technological approaches including hermetic packaging based on the LTCC substrate, deep reactive ion etching, neutral beam etching technology, and metal-assisted chemical etching, will be discussed.

Nguyen Van Toan received his B.S. degree in 2006 and his M.S. degree in 2009 in physics and electronics, respectively, from University of Science, Vietnam National University, Ho Chi Minh City, Viet Nam. He received his Dr. Eng. degree from Tohoku University in 2014 for research on silicon capable of integrating LSI for application to timing devices. He is working as an assistant professor in the Department of Mechanical Engineering, Graduate School of Engineering at Tohoku University. His current research interests include capacitive silicon resonators, optical modulator devices, capacitive micromachined ultrasonic transducers, thermal electric power generators, Knudsen pump, ion transportation, and metal-assisted chemical etching.

Takahito Ono is currently a Professor at Mechanical Systems Engineering, Graduate School of Engineering in Tohoku University. He was born in Hokkaido, Japan on 12 July 1967. He received the B.S. degree in physic from Hirosaki University, Japan, in 1990 and the M.S. degree in physics from Tohoku University, Japan. He received the Dr.Eng. degree in mechatronics and precision engineering from Tohoku University in 1996. During 1996-2001, he has been a Research Associate, and Lecturer in the Department of Mechatronics and Precision Engineering, Tohoku University. He had studied about nanomachining, scanning probe and its related technologies including high density storage devices. During 2001-2009, he has been an Associate Professor, and have developed nanomechanics and nanomechanical sensors. Since 2009, he is the Professor of Tohoku University. His expertise is in the area of microelectromechnical systems (MEMSs), nanoelectromechanical systems (NEMSs), silicon based nanofabrication, ultrasensitive sensing based on NEMSs/MEMSs. Also during 2012-2014 he was director of Micro/Nanomachining Research and Education Center, Tohoku University. Since 2010 he serves a co-director of "Microsystem Integration Center (µSiC), Tohoku University. Since 2013, he has additional post, a Professor of Guest Courses, Mechanical Departments, The University of Tokyo, and working on Nanomechanics.

Preface. Acknowledgements. About the Authors. 1. Introduction. 2. Capacitive Silicon Resonator Structures. 3. Fabrication Techniques for Capacitive Silicon Resonators. 4. Hermetically Packaged Capacitive Silicon Resonators on LTCC Substrate. 5. A Long Bar Type Capacitive Silicon Resonators with High-Quality Factors. 6. Capacitive Silicon Resonators Using Neutral Beam Etching Technology. 7. Capacitive Silicon Resonators with Narrow Gaps Formed by Metal-Assisted Chemical Etching. 8. Mechanically Coupled Capacitive Nanomechanical Silicon Resonators. 9. Capacitive Silicon Nanomechanical Resonators with Selective Vibration of High-Order Mode. 10. Capacitive Silicon Resonators with Movable Electrode. 11. Capacitive Silicon Resonators with Piezoresistive Heat. References. Conclusions