Treatise on Materials Science and Technology, Volume 28: Glass IV covers the developments in glass science and technology. The book discusses the use of silicon dioxide films in semiconductor devices; the nuclear waste glasses; and the synthesis and properties of oxynitride glasses. The text also describes the preparation, the properties, and the applications of heavy-metal fluoride glasses; and an analytical model of viscoelasticity in seals. Materials scientists and materials engineers will find the book invaluable.

List of ContributorsPreface1 Silicon Dioxide Films in Semiconductor Devices I. Introduction II. Physicochemical Aspects of Thin Glass Films III. Electrical Properties and Their Characterization IV. Conclusion References 2 Nuclear Waste Glasses I. Introduction II. Waste Disposal Strategy III. High-Level Waste IV. Processing Considerations-Vitrification V. Waste-Glass Performance VI. Radionuclide Immobilization in Waste-Glass Disposal Systems VII. Summary References 3 Oxynitride Glasses I. Introduction II. Oxynitride Glass Synthesis III. Compositional Systems IV. Oxynitride Glass Properties V. Crystallization of Oxynitride Glasses VI. Structure of Oxynitride Glasses VII. Applications of Oxynitride Glasses References 4 Heavy-Metal Fluoride Glasses I. Introduction II. Glass Formation and the Structure of Heavy-Metal Fluoride Glasses III. Preparation of Heavy-Metal Fluoride Glasses IV. Properties of Heavy-Metal Fluoride Glasses V. Summary and Conclusion References 5 Viscoelastic Analysis of Stresses in Composites I. Introduction II. Principles of Relaxation III. Viscoelastic Analysis of Seals IV. Setting Temperature in Stress Analysis of Composites V. Glass-to-Glass Seals VI. Conclusions Appendix. Constants in the Viscoelastic Analyses List of Symbols References Index