Joshua Pelleg received his B.Sc. in Chemical Engineering at the Technion-Institute of Technology, Haifa, Israel; a M.Sc. in Metallurgy at the Illinois Institute of Technology, Chicago, IL and a Ph.D. in Metallurgy at the University of Wisconsin, Madison, WI. He has been in the BenGurion University of the Negev (BGU) Materials Engineering Department in BeerSheva, Israel since 1970, and was among the founders of the department, and served as its second chairman. Professor Pelleg was the recipient of the Samuel Ayrton Chair in Metallurgy. He specializes in the mechanical properties of materials and the diffusion and defects in solids. He has chaired several university committees and served four terms as the Chairman of Advanced Studies at BenGurion University of the Negev. Prior to his work at BGU, Pelleg acted as Assistant Professor and then Associate Professor in the Department of Materials and Metallurgy at the University of Kansas, Lawrence, KS. Professor Pelleg was also a Visiting Professor: in the Department of Metallurgy at Iowa State University; at the Institute for Atomic Research, US Atomic Energy Commission, Ames, IA; at McGill University, Montreal, QC; at the Tokyo Institute of Technology, Applied Electronics Department, Yokohama, Japan; and in Curtin University, Department of Physics, Perth, Australia. His nonacademic research and industrial experience includes: Chief Metallurgist in Urdan Metallurgical Works Ltd., Netanyah, Israel; Research Engineer in International Harvester Manufacturing Research, Chicago, IL; Associate Research Officer for the National Research Council of Canada, Structures and Materials, National Aeronautical Establishment, Ottawa, ON; Physics Senior Research Scientist, Nuclear Research Center, BeerSheva, Israel; Materials Science Division, Argonne National Labs, Argonne, IL; Atomic Energy ofCanada, Chalk River, ON; Visiting Scientist, CSIR, National Accelerator Centre, Van de Graaf Group Faure, South Africa; Bell Laboratories, Murray Hill, NJ; and GTE Laboratories, Waltham, MA. His current research interests are diffusion in solids, thin film deposition and properties (mostly by sputtering) and the characterization of thin films, among them various silicides.

1 What are the silicides

References

2 Structure

References

3 Fabrication

3.1 Bulk Silicides

3.1.1 Arc Casting (Melting)

3.1.2 Directional Solidification

3.1.2.1 Bridgman

3.1.2.2 Czochralski

3.2 Thin Fims

3.2.1 Sputtering

3.2.2 Electron Beam Deposition

References

4 Testing Deformation

4.1 Introduction

4.2 Tension

4.2.1 CoSi₂

4.2.2 NiSi₂

4.2.3 MoSi₂

4.2.4 WSi₂

4.2.5 FeSi₂

4.2.6 TiSi₂

4.3 Compression

4.3.1 Introduction

4.3.2 CoSi₂

4.3.3 MoSi₂

4.3.4 WSi₂

4.3.5 TiSi₂

4.4 Indentation-Hardness

4.4.1 Introduction

4.4.2 NiSi₂ film

4.4.3 MoSi₂ Single Crystal

4.4.3.1 MoSi₂ Film

4.4.4 WSi₂ Film (Coating)

4.4.5 a-FeSi2

4.4.6 TiSi₂

References

5 Dislocations in silicides

5.1 Introduction

5.2 Dislocations in CoSi₂

5.2.1 Single Crystal

5.2.2 Film-Single Crystal Epitaxy

5.3 Dislocations in NiSi₂

5.3.1 Epitaxial Thin Film

5.4 Dislocations in MoSi₂

5.4.1 Single Crystals

5.5 Dislocations in WSi₂

5.5.1 Single Crystals

5.6 Dislocations in WSi₂

5.6.1 Single Crystals

References

6 Time Dependent Deformation - Creep in Silicides

6.1 Fundamentals od Creep

6.2 Creep in CoSi₂

6.3 Creep I MoSi₂

6.4 Creep in MoSi₂-WSi₂

6.5 Creep in TiSi₂

References

7 Fatigue in Silicides

7.1 Basics

7.2 Silicide Composites

7.2.1 Fatigue in MoSi₂ Composites

7.2.1.1 Nb Reinforcement

7.2.1.2 Reinforcement-Nb Spheres

7.2.1.3 Reinforcement-Nb Fibers

References

8. Fracture in Silicides

8.1 Fracture in CoSi₂ Single Crystals

8.2 Fracture in polycrystalline CoSi₂

8.3 Fracture in MoSi₂ Single Crystals

8.4 Fracture in Polycrystalline MoSi₂

8.5 Fracture in WSi₂ Single Crystals

8.6 Fracture in Polycrystalline TiSi₂

References

9. Deformation in Nano Silicides

9.1 Introduction

9.2 Tension Test

9.3 Hardness Tests

9.3.1 Hardness in Nano MoSi₂

9.3.2 Hardness in Nano FeSi₂

9.3.3 Hardness in Nano TiSi₂

References

10. The Effect of B

10.1 Introduction

10.2 B Effect in CoSi₂

10.3 B Effect in MoSi₂

10.4 B Effect in TiSi₂

References

11. Silicide Composites

11.1 Introduction

11.2 MoSi₂ Based Composites

11.2.1 MoSi₂/SiC

11.2.2 MoSi₂/Si₃N₄

11.3 MoSi₂/Silicide Composite

11.3.1 MoSi₂/TaSi2

11.3.2 MoSi₂/WSi₂

11.3.2 MoSi2/Mo₅Si₃

11.4 WSi₂ Based Composites

11.4.1 WSi₂/SiC

11.5. WSi₂/Silicides

11.5.1 WSi₂/TaSi₂

11.5 TiSi₂ Based Composites

11.5.1 TiSi₂/SiC

Referances

12 Alloying in Silicides

12.1 Introduction

12.2 Alloying of NiSi₂

12.3 Alloying of MoSi₂

12.3.1 Metallic Element Addition

12.3.2 Solid Solution Hardening (Softening

References

13. Grain Size Effect on Mechanical Properties

13.1 Introduction

13.2 MoSi₂ Static Properties

13.3 MoSi₂ Creep (Time Dependent) Properties

13.4 Ti₅Si₃ Static Properties

13.5 Ti₅Si₃ Creep (Time Dependent) Properties

References

14. Environmental Effect on Mechanical Properties

14.1 Introduction

14.2 CoSi₂-Oxidation

14.3 NiSi₂-Oxidation

14.4 MoSi₂-Oxidation

14.5 WSi₂-Oxidation

14.6 TiSi₂-Oxidation

References

This book focuses on the mechanical properties of silicides for very large scale integration (VLSI) applications. It presents the fabrication process for bulk silicides and thin films, and list complete testing deformation for a variety of silicon based compounds. The author also presents dislocation in silicides, fatigue and fracture aspects. A special chapter is given on deformation in silicides in the nano scale. Composites and alloys are also considered.