The progress of materials science has promoted the rapid development of the global economy, whether it is smart polymer materials with sensing systems, or photoresist materials that promote the development of semiconductor integrated circuits from the micron to the nano level, are the most promising development direction in the field. The photochromic molecules are introduced into the polymer network to prepare smart polymer elastomers with photocontrolled deformation function or photoresist materials with photocontrolled depolymerization performance, which opens up a new direction for the preparation of functional materials. However, how to improve the photosensitivity of this kind of material, speed up its light response speed, and have excellent physicochemistry performance, so that it colud be applied to human daily life, this series of problems still need to be solved. Hexaryldiimidazole (HABI), as a photochromic molecular switch with fast photochemical response, could be integrated into polymers and used to manufacture functional polymer materials and DUV photoresist materials, providing a key idea to solve important scientific problems in this field.

Prof. Shi-Li Xiang received the doctoral degree in 2021. After that, He joined JFS Laboratory as the R&D director of lithography technology. Currently, his research is mainly focused on the development of advanced lithography technology, as well as the development of semiconductor key materials.